METHOD FOR MANUFACTURING POLY CRYSTALLINE SILICON LAYER

摘要

PURPOSE: A method for manufacturing a multi crystal silicon layer is provided to efficiently promote crystallization by contacting an amorphous silicon layer with a metal mixed layer and performing a crystallization heat process. CONSTITUTION: An amorphous silicon layer(20) is formed on a substrate(10). A metal mixed layer(30) is formed on the amorphous silicon layer. The amorphous silicon layer is crystallized and thermally processed. The amorphous silicon layer is made with CVD(Chemical Vapor Deposition).