| 摘要 |
<p>PURPOSE: An active ray-sensitive or radiation-sensitive resin composition and a resist film and a pattern forming method using the same are provided to form patterns of superior profiles and to improve the roughness characteristic and the sensitivity of the composition. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a resin. The resin includes repeating units. One repeating unit is represented by chemical formula I. Another repeating unit generates acid based on the radiation of active ray or radiation. In the chemical formula I, the AR is aryl group. The Rn is alkyl group, cycloalkyl group, or aryl group. The Rn is capable of being bonded with the AR to form non-aromatic ring. The R1 is hydrogen, alkyl group, cyclo alkyl group, halogen, cyano group, or alkyloxycarbonyl group.</p> |
