发明名称 ANTI FUSE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE: An anti-fuse of a semiconductor device is provided to improve the properties of the semiconductor by improving the destruction efficiency of a gate insulating layer. CONSTITUTION: A semiconductor substrate comprises an active area(102) which is defined as an element isolation film(104). A gate(106) is composed of a plurality of gate lines which are formed in a gate insulating layer of the semiconductor substrate. Contact plugs(108) are separated from the gate line at regular intervals by a plurality of gate lines. The plurality of gate lines comprises a first gate line(106a), a second gate line(106b), and a third gate line(106c). The first gate line, the second gate line, and the third gate line are connected with one gate line(107) which is included in the one-side end. A bit line contact plug(110) is installed on the top of one gate line.
申请公布号 KR20120002750(A) 申请公布日期 2012.01.09
申请号 KR20100063420 申请日期 2010.07.01
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, JIN HWAN
分类号 H01L21/82 主分类号 H01L21/82
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