| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain an exposure device in which the liquid remaining between the surface of a substrate on the substrate stage side and the substrate stage can be reduced. <P>SOLUTION: The exposure device that exposes a substrate through liquid by using the pattern of a mask comprises a holding part 2 having a stage which moves on a substrate 1 and holds the substrate 1, an auxiliary part 3 which is arranged on the outer periphery of the holding part 2 and supports the liquid along with the substrate 1, and a recovery part 5 which collects the liquid that runs through the gap between the outer peripheral surface of the holding part 2 and the inner peripheral surface of the auxiliary part 3 through a collection port 4. The gap between the outer peripheral surface of the holding part 2 and the inner peripheral surface of the auxiliary part 3 decreases toward the collection port 4. <P>COPYRIGHT: (C)2012,JPO&INPIT |
