发明名称 INSPECTION APPARATUS AND INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an inspection apparatus and an inspection method capable of minimizing a measurement error and accurately measuring a stage position. <P>SOLUTION: A measuring system 122 measures a position of an XY&theta; stage 102 with a laser interferometer 201 and a linear scale 202. A measured value measured by the laser interferometer 201 is converted to position component data on a position calculation part 203 and then passes through a low pass filter 204. A measured value measured by the linear scale 202 is converted to position component data on the position calculation part 203 and then passes through a high pass filter 205. The data passing through the low pass filter 204 and the data passing through the high pass filter 205 are added and combined on an adder 206. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012002731(A) 申请公布日期 2012.01.05
申请号 JP20100139164 申请日期 2010.06.18
申请人 NUFLARE TECHNOLOGY INC 发明人 TAMAMUSHI SHUICHI
分类号 G01N21/956 主分类号 G01N21/956
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