发明名称 PHOTOCURABLE AND THERMOCURABLE RESIN COMPOSITION, AND DRY FILM SOLDER RESIST
摘要 The present invention relates to a photocurable and thermocurable resin composition that shows improved alkali developability and is capable of providing a dry film solder resist having good heat resistance and dimensional stability, and to a dry film solder resist. The resin composition may comprise: an acid-modified oligomer having a carboxyl group (-COOH) and a photocurable functional group; a photopolymerizable monomer having an epoxy acrylate group of 3 or more functions bonded to a nitrogen-containing heteroring, and a compound configured with a functional group having a carboxyl group bonded to one expoxy acrylate group or more; a thermocurable binder having a thermocurable functional group; and a photoinitiator.
申请公布号 WO2011118939(A3) 申请公布日期 2012.01.05
申请号 WO2011KR01889 申请日期 2011.03.18
申请人 LG CHEM, LTD.;JEONG, WOO-JAE;CHOI, BYUNG-JU;CHOI, BO-YUN;LEE, KWANG-JOO;JEONG, MIN-SU 发明人 JEONG, WOO-JAE;CHOI, BYUNG-JU;CHOI, BO-YUN;LEE, KWANG-JOO;JEONG, MIN-SU
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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