| 摘要 |
PURPOSE: Maintenance liquid is provided to reduce the defect of pattern transfer in case of ultra fine pattern transferring. CONSTITUTION: Maintenance liquid comprises compounds containing an ester and/or an ether functional group. The maintenance liquid is used for a pattern forming method including: a step of discharging a photo curable composition mainly containing polymerizable monomers, on a substrate or a mold having ultra fine patterns, by using ink-jet device; and a step of photo-radiating with a state inserted by the substrate and the mold. |
