PURPOSE: A semiconductor device including a contact plug is provided to obtain high reliability and integration by increasing an amount of turn-on currents of a field effect transistor by widening an active area. CONSTITUTION: A device isolation pattern(102) is arranged on a substrate to define an active area(ACT). A gate electrode(110) is arranged on the upper side of the active area. A capping dielectric pattern is arranged on the gate electrode. A first source/drain area(122) and a second source/drain area(124) are formed in the active area of both sides of the gate electrode. An interlayer dielectric layer(130) is arranged on the substrate including the gate electrode.
申请公布号
KR20120001897(A)
申请公布日期
2012.01.05
申请号
KR20100062512
申请日期
2010.06.30
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
CHAE, KYO SUK;YAMADA SATORU;HAN, SANG YEON;CHOI, YOUNG JIN;KIM, WOOK JE