| 发明名称 |
SUBMICRON SIZED SILICON POWDER WITH LOW OXYGEN CONTENT |
| 摘要 |
A submicron sized Si based powder having an average primary particle size between 20 nm and 200 nm, wherein the powder has a surface layer comprising SiOx, with 0<x<2, the surface layer having an average thickness between 0.5 nm and 10 nm, and wherein the powder has a total oxygen content equal or less than 3% by weight at room temperature. The method for making the powder comprises a step where a Si precursor is vaporized in a gas stream at high temperature, after which the gas stream is quenched to obtain Si particles, and the Si particles are quenched at low temperature in an oxygen containing gas. |
| 申请公布号 |
CA2800929(A1) |
申请公布日期 |
2012.01.05 |
| 申请号 |
CA20112800929 |
申请日期 |
2011.06.22 |
| 申请人 |
UMICORE |
发明人 |
SCOYER, JEAN;PUT, STIJN;NELIS, DANIEL;DRIESEN, KRIS |
| 分类号 |
C01B33/00;C01B33/02;C01B33/027;C01B33/029;C01B33/03 |
主分类号 |
C01B33/00 |
| 代理机构 |
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