| 摘要 |
Disclosed is a gas barrier formation method which, without heat treating a coating film formed by applying a coating liquid containing polysilazanes, has high gas barrier performance achieved by an extremely quick modification treatment of a few seconds; also disclosed is a gas barrier film. In the disclosed gas barrier film formation method, a discharge gas containing an inert gas is supplied to the surface of a coating film formed by coating a substrate with a coating liquid containing polysilazanes. Plasma formed in a discharge space to which a high frequency electric field is applied, or light emitted from said plasma, is irradiated onto the surface of the aforementioned coating film to modify the same and to form a gas barrier film. The aforementioned discharge gas contains at least a carbon dioxide gas or carbon monoxide gas, the content thereof being between 0.01 volume% and 3.0 volume%, and the frequency of the aforementioned high frequency electric field is in the microwave range between 300 and 30,000 MHz.
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