发明名称 |
PHOTOVOLTAIC CELL MANUFACTURE |
摘要 |
A photovoltaic cell manufacturing method is disclosed. Methods include manufacturing a photovoltaic cell having a selective emitter and buried contact (electrode) structure utilizing nanoimprint technology. The methods include providing a semiconductor substrate having a first surface and a second surface opposite the first surface; forming a first doped region in the semiconductor substrate adjacent to the first surface; performing a nanoimprint process and an etching process to form a trench in the semiconductor substrate, the trench extending into the semiconductor substrate from the first surface; forming a second doped region in the semiconductor substrate within the trench, the second doped region having a greater doping concentration than the first doped region; and filling the trench with a conductive material. The nanoimprint process uses a mold to define a location of an electrode line layout.
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申请公布号 |
US2012003780(A1) |
申请公布日期 |
2012.01.05 |
申请号 |
US20100827213 |
申请日期 |
2010.06.30 |
申请人 |
TU CHIH-CHIANG;CHEN CHUN-LANG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
TU CHIH-CHIANG;CHEN CHUN-LANG |
分类号 |
H01L31/0236;H01L31/0224;H01L31/18 |
主分类号 |
H01L31/0236 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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