METHOD OF FORMING PHOTOMASK, COMPUTER-READABLE RECORDING MEDIUM STORING PROGRAMMED INSTRUCTIONS FOR EXECUTING THE METHOD, AND MASK IMAGING SYSTEM

摘要

A method of forming a photomask includes providing a layout of design patterns, setting an optical proximity correction (OPC) with respect to the layout of design patterns, and forming a layout of correction patterns with respect to the layout of design patterns by using the set OPC. The method also includes collecting verification data about the layout of correction patterns by using a layout of contour patterns based on the layout of correction patterns, and verifying whether the layout of design patterns and the layout of correction patterns are substantially identical to each other by using the verification data.