发明名称 Formation of III-V Based Devices on Semiconductor Substrates
摘要 A device includes a semiconductor substrate, and insulation regions in the semiconductor substrate. Opposite sidewalls of the insulation regions have a spacing between about 70 nm and about 300 nm. A III-V compound semiconductor region is formed between the opposite sidewalls of the insulation regions.
申请公布号 US2012001239(A1) 申请公布日期 2012.01.05
申请号 US20100827709 申请日期 2010.06.30
申请人 KO CHIH-HSIN;WANN CLEMENT HSINGJEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 KO CHIH-HSIN;WANN CLEMENT HSINGJEN
分类号 H01L27/085;H01L29/20 主分类号 H01L27/085
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