发明名称 |
C-SHAPED CONFINEMENT RING FOR A PLASMA PROCESSING CHAMBER |
摘要 |
Described herein is a confinement ring useful as a component of a capacitively-coupled plasma processing chamber. Inner surfaces of the confinement ring provide an extended plasma confinement zone surrounding a gap between an upper electrode and a lower electrode on which a semiconductor substrate is supported during plasma processing in the chamber. |
申请公布号 |
US2012000608(A1) |
申请公布日期 |
2012.01.05 |
申请号 |
US20100828065 |
申请日期 |
2010.06.30 |
申请人 |
KELLOGG MICHAEL C.;MARAKHTANOV ALEXEI;DHINDSA RAJINDER;LAM RESEARCH CORPORATION |
发明人 |
KELLOGG MICHAEL C.;MARAKHTANOV ALEXEI;DHINDSA RAJINDER |
分类号 |
C23F1/08;C23C14/34;C23C16/50 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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