发明名称 SEMICONDUCTOR DEVICE
摘要 <p>In order to more stably form an ohmic junction between an electrode and a semiconductor layer, and to be able to decrease the electrical contact resistance therebetween, the disclosed semiconductor device is provided with: a semiconductor layer (103) comprising an oxide semiconductor material containing indium; an ohmic electrode (107) that has an ohmic junction with said semiconductor layer (103); and an intermediate layer (106) provided between the semiconductor layer (103) and the ohmic electrode (107). The intermediate layer (106) has: a first region (106a) that has a greater concentration of indium atoms than the inside of the semiconductor layer (103); and a second region (106b) that has a smaller concentration of indium atoms than the first region (106a) does.</p>
申请公布号 WO2012002573(A1) 申请公布日期 2012.01.05
申请号 WO2011JP65525 申请日期 2011.06.30
申请人 ADVANCED INTERCONNECT MATERIALS, LLC;KOIKE JUNICHI;YUN PILSANG;KAWAKAMI HIDEAKI 发明人 KOIKE JUNICHI;YUN PILSANG;KAWAKAMI HIDEAKI
分类号 H01L21/28;H01L29/417;H01L29/786;H01L33/40 主分类号 H01L21/28
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