| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing method for a substrate that can simultaneously remove a resist film and a protective film formed on the resist film, used in a semiconductor photo mask consisting of a synthetic quartz glass substrate and nanoimprint technology, easily recover the unnecessary film components, and use the solvent for the detachment for a long period, while improving the removal capability for the resist film or the protective film and reducing the tact time for removing them. <P>SOLUTION: A synthetic quartz glass substrate on which a resist film is covered is immersed in solvent in which terpenes are dissolved, the resist film is detached and the substrate is rinsed with water. <P>COPYRIGHT: (C)2012,JPO&INPIT |
