| 摘要 |
<P>PROBLEM TO BE SOLVED: To recover processing liquid supplied onto the surface of a substrate well regardless of the rotational speed of the substrate. <P>SOLUTION: The substrate liquid processing apparatus (1) which processes a rotating substrate (2) by supplying processing liquid thereto comprises a turntable (28) which rotates the substrate (2) while holding it horizontally, an annular recovery cup (39) disposed on the lower periphery of the substrate (2) in order to recover the processing liquid supplied to the substrate (2), a recovery groove (44) formed between the inner peripheral wall (43) and the outer peripheral wall (42) of the recovery cup (39), and a cup cover (47) arranged on the inner peripheral wall (43) of the recovery cup (39) to stretch obliquely inward toward the recovery groove (44). <P>COPYRIGHT: (C)2012,JPO&INPIT |
