SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: The temperature management in the peripheral part and central part of a substrate and temperature control independently without interfering them respectively. CONSTITUTION: A board loading stand(20) is arranged within a process chamber(10). A plurality of support pins(28) supporting the substrate(W) are installed in the process chamber. An elevating mechanism(29) raises the support pin up and down. A periphery loading member(40) loads a substrate rim part(W1). A center loading member(50) loads a substrate central part(W2). A support stand(55) supports the periphery loading member and the center loading member.