POLYMER MANUFACTURING METHOD, POLYMER FOR SEMICONDUCTOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE WITH PATTERN FORMED THEREON

摘要

PROBLEM TO BE SOLVED: To provide a polymer manufacturing method capable of reducing an unreacted monomer component remaining in a polymer, without decreasing the productivity.

SOLUTION: The polymer manufacturing method includes: a polymerization process for subjecting a monomer to polymerization reaction in a polymerization solvent in the existence of the polymerization initiator to generate the polymer; and a purification process for supplying the reaction solution, obtained by the polymerization process, to a poor solvent for reprecipitation. In the polymerization process, part or all of the monomer is supplied by dropping, and the mass of the polymerization solvent supplied for the polymerization reaction is 2.0 times or less of the mass of the entire monomer.

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