发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device that has two ohmic electrodes and a gate electrode disposed therebetween, and can be manufactured without any defect in gate electrode formation due to fluctuations of an electron beam for the gate electrode formation. <P>SOLUTION: As the ohmic electrode (source electrode 14s) closer to the gate electrode 20 of the semiconductor device 1, a rectangular ohmic electrode is employed such that at least one corner on the side opposed to the gate electrode 20 (a corner on the side of a drawing start position for the electron beam) is cut. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012004208(A) 申请公布日期 2012.01.05
申请号 JP20100135943 申请日期 2010.06.15
申请人 FUJITSU LTD 发明人 MAKIYAMA KOZO
分类号 H01L21/338;H01L29/41;H01L29/812 主分类号 H01L21/338
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