METHOD FOR MANUFACTURING PHOTO MASK, AND PHOTO MASK

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a photo mask with higher accuracy compared with the case that a photomask blank having a conventional light shielding film is used in an etching process of a light shielding film, by reducing pattern size variance caused by density dependency of patterns to be formed.

SOLUTION: A photo mask is manufactured from a photomask blank having a light shielding film laminated with or without another film on a transparent substrate and composed of a metal or a metallic compound capable of being etched by fluorine-based dry etching; an anti-reflection film formed on the light shielding film and composed of a metal or a metallic compound capable of being etched by fluorine-based dry etching; and an etching mask film with a film thickness of 2 to 30 nm formed on the anti-reflection film and composed of a metal or a metallic compound which has resistance to the fluorine-based dry etching. A manufacturing method of the photomask includes resist patterning, chlorine-based dry etching, and fluorine-based dry etching.

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