发明名称 |
METHOD FOR OPERATING DETECTOR WITHIN GAS CONDITIONED ENVIRONMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is provided with a projection lens system having a gas conditioned environment that is less sensitive to ambient atmosphere variations. <P>SOLUTION: A lithographic apparatus is disclosed. The lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The lithographic apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012004598(A) |
申请公布日期 |
2012.01.05 |
申请号 |
JP20110216998 |
申请日期 |
2011.09.30 |
申请人 |
ASML NETHERLANDS BV;CARL ZEISS SMT GMBH |
发明人 |
VAN EMPEL TJARKO ADRIAAN R;LOOPSTRA ERIK ROELOF;VAN DER NET ANTONIUS J;YURI JOHANNES GABRIEL VAN DE VIJVER;BERNARD GERLICH;BAUKE JANSEN;RENS SANDERSE |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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