发明名称 Inspection system by charged particle beam
摘要 An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.
申请公布号 EP2365512(A3) 申请公布日期 2012.01.04
申请号 EP20110004165 申请日期 2001.06.27
申请人 EBARA CORPORATION;KABUSHIKI KAISHA TOSHIBA 发明人 NAKASUJI, MAMORU;NOJI, NOBUHARU;SATAKE, TORU;HATAKEYAMA, MASAHIRO;KIMBA, TOSHIFUMI;SOBUKAWA, HIROSI;YOSHIKAWA, SHOJI;MURAKAMI, TAKESHI;WATANABE, KENJI;KARIMATA, TSUTOMU;OOWADA, SHIN;SAITO, MUTSUMI;YAMAZAKI, YUICHIRO;NAGAI, TAKAMITSU;NAGAHAMA, ICHIROTA
分类号 H01J37/063;G01N23/225;H01J37/06;H01J37/073;H01J37/18;H01J37/20;H01J37/22;H01J37/244;H01J37/28;H01J37/29;H01L21/027;H01L21/66;H01L21/67;H01L21/677 主分类号 H01J37/063
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