发明名称 Method and apparatus for controlling depth of deposition of a solvent free functional material in a receiver
摘要 <p>A method and apparatus for delivering a functional material to a receiver includes a pressurized source (12) of solvent in a thermodynamically stable mixture with a functional material. The solvent is in a liquid state within the pressurized source. A discharge device (13) having an inlet and an outlet is connected to the pressurized source at the inlet such that the thermodynamically stable mixture is ejected from the outlet. A receiver (14) having a back is positioned a predetermined distance from the outlet of the discharge device. The solvent of the thermodynamically mixture evaporates at a location beyond the outlet of the discharge device and a predetermined amount of the functional material contacts the receiver at a predetermined distance from the back of the receiver. &lt;IMAGE&gt;</p>
申请公布号 EP2385083(A3) 申请公布日期 2012.01.04
申请号 EP20110176304 申请日期 2002.07.01
申请人 EASTMAN KODAK COMPANY 发明人 JAGANNATHAN, RAMESH;IRVIN, JR., GLEN C.;JAGANNATHAN, SESHADRI;SADASIVAN, SRIDHAR;RUEPING, JOHN E.;MERZ, GARY E.
分类号 B41J2/01;C09D11/02;B05D1/02;B41J2/015;B41J2/175;B41J2/21;C09D11/00 主分类号 B41J2/01
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