发明名称 METHOD FOR PRODUCING SEMICONDUCTOR PORCELAIN COMPOSITION
摘要 [PROBLEMS] To provide a method for producing a semiconductor porcelain composition which can shift the Currie temperature to the positive direction without the use of Pb and can produce a semiconductor porcelain composition being markedly reduced in the resistivity at room temperature, and a method for producing a semiconductor porcelain composition which can impart uniform characteristics also to the interior of a material with no complicated heat treatment even if the material has a shape of a relatively great thickness. [MEANS FOR SOLVING PROBLEMS] A method for producing a semiconductor porcelain composition which has an empirical formula represented by [(Bi 0.5 Na 0.5 ) x (Ba 1-y R y ) 1-x ]TiO 3 (where R is at least one of La, Dy, Eu, Gd and Y), where x and y satisfy 0 < x ‰¦ 0.14 and 0.002 < y ‰¦ 0.02, and wherein the sintering of the composition is carried out in an inert gas atmosphere having an oxygen concentration of 1% or less, and thereby, the resistivity at room temperature can be remarkably reduced and uniform characteristics can be imparted also to the interior of the resultant material.
申请公布号 EP1873130(A4) 申请公布日期 2012.01.04
申请号 EP20060730764 申请日期 2006.03.31
申请人 HITACHI METALS, LTD. 发明人 SHIMADA, TAKESHI;TERAO, KOICHI;TOJI, KAZUYA
分类号 C04B35/468;C04B35/626;H01C7/02;H01G4/12 主分类号 C04B35/468
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