发明名称 |
Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device |
摘要 |
<p>Methods for forming a conductive oxide layer 14 on a substrate 12 are provided. The method can include sputtering a transparent conductive oxide layer ("TCO layer") 14 on a substrate 12 from a target (e.g., including cadmium stannate) at a sputtering temperature of about 10° C to about 100° C. The TCO layer can then be annealed in an anneal temperature comprising cadmium at an annealing temperature of about 500° C to about 700° C. The method of forming the TCO layer 14 can be used in a method for manufacturing a cadmium telluride based thin film photovoltaic device 10, further including forming a cadmium sulfide layer 18 over the transparent conductive oxide layer 14 and forming a cadmium telluride layer 20 over the cadmium sulfide layer 18.</p> |
申请公布号 |
EP2403016(A1) |
申请公布日期 |
2012.01.04 |
申请号 |
EP20110172284 |
申请日期 |
2011.06.30 |
申请人 |
PRIMESTAR SOLAR, INC |
发明人 |
FELDMAN-PEABODY, SCOTT DANIEL;GOSSMAN, ROBERT DWAYNE |
分类号 |
H01L21/02;H01L31/0224;H01L31/073;H01L31/18 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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