发明名称 Vertical power semiconductor device and method of making the same
摘要 <p>A power MOSFET (400) includes a semiconductor substrate (402) having a drift region (404) therein and a transition region (424) that extends between the drift region and a first surface (402a) of the semiconductor substrate. The transition region has a vertically retrograded doping profile therein that peaks at a first depth relative to the first surface. First and second base shielding regions (412) extending laterally towards each other to constrict a neck of the upper portion of the transition region are moreover provided under respective first and second base regions (414) to deplete the transition region. </p>
申请公布号 EP2362422(A3) 申请公布日期 2012.01.04
申请号 EP20110166099 申请日期 2002.04.05
申请人 SILICON SEMICONDUCTOR CORPORATION 发明人 BALIGA, BANTVAL JAYANT
分类号 H01L29/78;H01L21/336;H01L21/76;H01L29/06;H01L29/08;H01L29/10;H01L29/36;H01L29/40;H01L29/417;H01L29/872 主分类号 H01L29/78
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