发明名称 |
Vertical power semiconductor device and method of making the same |
摘要 |
<p>A power MOSFET (400) includes a semiconductor substrate (402) having a drift region (404) therein and a transition region (424) that extends between the drift region and a first surface (402a) of the semiconductor substrate. The transition region has a vertically retrograded doping profile therein that peaks at a first depth relative to the first surface. First and second base shielding regions (412) extending laterally towards each other to constrict a neck of the upper portion of the transition region are moreover provided under respective first and second base regions (414) to deplete the transition region.
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申请公布号 |
EP2362422(A3) |
申请公布日期 |
2012.01.04 |
申请号 |
EP20110166099 |
申请日期 |
2002.04.05 |
申请人 |
SILICON SEMICONDUCTOR CORPORATION |
发明人 |
BALIGA, BANTVAL JAYANT |
分类号 |
H01L29/78;H01L21/336;H01L21/76;H01L29/06;H01L29/08;H01L29/10;H01L29/36;H01L29/40;H01L29/417;H01L29/872 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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