| 摘要 |
PURPOSE: A method and device for coating a coating layer are provided to improve uniformity of the thickness of the coating layer by locally controlling a temperature of a specific range in a radius direction of a substrate on the rear of the substrate. CONSTITUTION: A spin chuck(122) which rotates a wafer(W) is installed in the center of a casing(120). The spin chuck includes a chuck driving device(124) with a rotation driving source. A cup(130) is installed around the spin chuck to receive liquid from the wafer. A fan filter unit(126) is installed on the upper side of the casing to form the down flow of clean air. An exhaust duct(127) is connected to the lower side of the casing to exhaust the atmosphere of the casing. |
