发明名称 |
Lithography system and projection method |
摘要 |
<p>The present invention relates a probe forming lithography system for generating an pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched "on" or "off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.
</p> |
申请公布号 |
EP2323158(A3) |
申请公布日期 |
2012.01.04 |
申请号 |
EP20110157080 |
申请日期 |
2007.03.09 |
申请人 |
MAPPER LITHOGRAPHY IP B.V. |
发明人 |
KRUIT, PIETER;WIELAND, MARCO JAN-JACO;STEENBRINK, STIJN WILLEM KAREL HERMAN;JAGER, REMCO |
分类号 |
H01J37/317;B82Y10/00;G03F7/20;H01J37/302 |
主分类号 |
H01J37/317 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|