发明名称 POSITIVE-TYPE RESIST COMPOSITION, AND METHOD FOR PRODUCTION OF MICROLENS
摘要 There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3‰¤n1‰¤1.0.
申请公布号 EP2302456(A4) 申请公布日期 2012.01.04
申请号 EP20090797841 申请日期 2009.07.07
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 YUKAWA, SHOJIRO;KISHIOKA, TAKAHIRO;SAKAGUCHI, TAKAHIRO;SODA, HIROYUKI
分类号 G03F7/023;C08F12/32;G02B1/04;G02B3/00;G02F1/1333;G03F7/004 主分类号 G03F7/023
代理机构 代理人
主权项
地址