发明名称 |
Set of masks, method of generating mask data and method for forming a pattern |
摘要 |
A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating resized data by enlarging the design data by a resizing quantity; generating first mask data by filling a space area having a space width of a space quantity or less of the resized data; and generating second mask data, to be aligned with the first mask data, having a window portion for selectively exposing an area determined by enlarging the space area by the resizing quantity. |
申请公布号 |
US8091046(B2) |
申请公布日期 |
2012.01.03 |
申请号 |
US20080010933 |
申请日期 |
2008.01.31 |
申请人 |
TANAKA SATOSHI;HASHIMOTO KOJI;KABUSHIKI KAISHA TOSHIBA |
发明人 |
TANAKA SATOSHI;HASHIMOTO KOJI |
分类号 |
G03F1/08;G06F17/50;G03F1/14;G03F1/36;G03F1/68;G03F7/00;G03F7/20;G03F9/00;H01L21/027;H01L21/311;H01L21/3213 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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