发明名称 |
Base soluble polymers for photoresist compositions |
摘要 |
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom atα-position and/orβ-position and/orγ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
|
申请公布号 |
US8088564(B2) |
申请公布日期 |
2012.01.03 |
申请号 |
US20080263511 |
申请日期 |
2008.11.03 |
申请人 |
ABDALLAH DAVID;HOULIHAN FRANCIS;AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
ABDALLAH DAVID;HOULIHAN FRANCIS |
分类号 |
G03F7/40;C08G75/20;G03F7/039 |
主分类号 |
G03F7/40 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|