发明名称 |
System for control of gas injectors |
摘要 |
A substrate processing system has computer controlled injectors. The computer is configured to adjust a plurality of injectors, such as during deposition of a graded layer, between depositions of two different layers, or between deposition and chamber clean steps. |
申请公布号 |
US8088223(B2) |
申请公布日期 |
2012.01.03 |
申请号 |
US20060373408 |
申请日期 |
2006.03.09 |
申请人 |
TODD MICHAEL A.;WEEKS KEITH D.;JACOBSON PAUL T.;ASM AMERICA, INC. |
发明人 |
TODD MICHAEL A.;WEEKS KEITH D.;JACOBSON PAUL T. |
分类号 |
C23C16/455;C23C16/06;C23C16/22;C23C16/52 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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