发明名称 System for control of gas injectors
摘要 A substrate processing system has computer controlled injectors. The computer is configured to adjust a plurality of injectors, such as during deposition of a graded layer, between depositions of two different layers, or between deposition and chamber clean steps.
申请公布号 US8088223(B2) 申请公布日期 2012.01.03
申请号 US20060373408 申请日期 2006.03.09
申请人 TODD MICHAEL A.;WEEKS KEITH D.;JACOBSON PAUL T.;ASM AMERICA, INC. 发明人 TODD MICHAEL A.;WEEKS KEITH D.;JACOBSON PAUL T.
分类号 C23C16/455;C23C16/06;C23C16/22;C23C16/52 主分类号 C23C16/455
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