发明名称 |
Exposure apparatus, exposure method, and device manufacturing method |
摘要 |
An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space. |
申请公布号 |
US8089608(B2) |
申请公布日期 |
2012.01.03 |
申请号 |
US20060887584 |
申请日期 |
2006.04.17 |
申请人 |
NAGASAKA HIROYUKI;SHIRAISHI KENICHI;FUJIWARA TOMOHARU;OWA SOICHI;MIWA AKIHIRO;NIKON CORPORATION |
发明人 |
NAGASAKA HIROYUKI;SHIRAISHI KENICHI;FUJIWARA TOMOHARU;OWA SOICHI;MIWA AKIHIRO |
分类号 |
G03B27/32;G03B27/42;G03B27/52 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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