| 摘要 |
<p>PURPOSE: An active ray-sensitive or radiation-sensitive resin composition, a resist film using the same, and a method for forming patterns are provided to improve the out gas performance in an exposing process, the line-edge-roughness, the pattern shape, the resolution, and the sensitivity of the composition. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a resin. The resin includes a first repeating unit and a second repeating unit. The first repeating unit includes an ionic structure part which generates an acid anion to the side chain of the resin by being decomposed based on irradiation by an active ray or radiation. The second repeating unit is represented by chemical formula I. The cation of the ionic structure part is diaryliodium cation which is represented by chemical formula A1. A resist film is formed based on the composition.</p> |
