| 摘要 |
PURPOSE: A chemical-mechanical planarization composition and chemical-mechanical planarization method are provided to secure the excellent corrosion protection function. CONSTITUTION: A chemical-mechanical planarization composition contains the following: a compound selected from the group consisting of cyanurate, isocyanurate, oxalic acid, and their salt; an abrasive; and an oxidizer. A chemical-mechanical planarization method of a surface containing a barrier layer material comprises the following steps: contacting a substrate with the surface containing the barrier layer material with a polishing pad; applying the chemical-mechanical planarization composition; and polishing the substrate with the composition.
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