发明名称 VAPOR DEPOSITION METHODS OF E-BEAM TYPE
摘要 PURPOSE: A method for depositing inline type of e-beam way is provided to improve marketability and manufacturing productivity by forming the first chamber, second chamber and third chamber in parallel with each other. CONSTITUTION: A method for depositing inline type of e-beam way comprises next steps. First, second, and third chambers(10,20,30) are formed in an inline type. A carrier(5), in which a product is mounted, is installed in a first chamber and pumps under vacuum conditions. The carrier of the first chamber inside is transferred to a second chamber. The product of the carrier carried to the second chamber is evaporated to the e-beam mode. The carrier completed the evaporation of the second chamber inside is transferred to the third chamber.
申请公布号 KR20110139818(A) 申请公布日期 2011.12.30
申请号 KR20100059869 申请日期 2010.06.24
申请人 LEE, JAE BACK 发明人 LEE, JAE BACK;KIM, JONG HOE
分类号 C23C14/22;C23C14/24;C23C14/46 主分类号 C23C14/22
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