<p>PURPOSE: A method for fabricating a dye-sensitized solar cell is provided to implement a porosity semiconductor layer under low temperature in short time by using a near infrared ray thermal process. CONSTITUTION: In a method for fabricating a dye-sensitized solar cell, a lower plate is a light transmission substrate. A first electrode(20) is formed on a lower substrate. A semiconductor layer is formed on the first electrode and includes metal oxide particles(30). Metal oxide particles are coated on the first electrode and are sintered through near infrared ray.</p>
申请公布号
KR20110139835(A)
申请公布日期
2011.12.30
申请号
KR20100059896
申请日期
2010.06.24
申请人
IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY);KONKUK UNIVERSITY INDUSTRIAL COOPERATION CORP.