ORGANORUTHENIUM COMPOUND FOR CHEMICAL DEPOSITION AND CHEMICAL DEPOSITION PROCESS USING THE ORGANORUTHENIUM COMPOUND

摘要

PURPOSE: An organoruthenium compound for chemical deposition is provided to ensure relatively high vapor pressure and to ensure proper film formation. CONSTITUTION: An organoruthenium compound for chemical deposition is denoted by chemical formula 1. A chemical deposition of a ruthenium thin film or ruthenium compound thin film comprises a step of vaporizing organic ruthenium compounds of chemical formula 1 for using reaction gar; and a step of introducing reaction gas to the substrate surface and heating.