| 摘要 |
<p>Subject of the invention is a new implementation of the gas distribution process chamber aimed at being used in enhanced processing devices for processing solid particles in a fluidized layer and refers to the construction solution of the essential element of the device for drying, granulating and coating, this means a processing chamber with a gas distribution panel which improves the quality of such processes. The invention describes the implementation of the processing chamber with distribution panel (4) whose integral part is linked to the elevating mechanism. This allows the lifting of the upper assembly (7) against the lower assembly (11) of the distribution panel (4) and thus an increase of the vertical distance between the upper assembly (7) and the lower one (11) of the distribution panel (4). This way the washability of the chamber is enhanced, while also a gravitational release of the product from the chamber through the distribution panel is possible.</p> |
