SUBSTRATE HOLDER, FILM-FORMING DEVICE, AND FILM-FORMING METHOD

摘要

Provided is a substrate holder capable of preventing thermal damage of a film substrate and obtaining an appropriate film forming process. The substrate holder (20) has a metal holder main body (21) and a close contact mechanism (22) for maintaining the close contact state of a substrate (S) to the support surface (21a) of the holder main body (21). The support surface (21a) is formed by a partial circumferential surface of a cylindrical body having an axial direction parallel with the axial center and a circumferential direction around the axial center. This makes it possible to enhance a close contact property between the support surface (21a) and the substrate (S). The close contact mechanism (22) has a fixture (221) for fixing both ends of the substrate (S) and a spring member (223) for applying tension along the circumferential direction to the substrate (S). Imparting a predetermined tension to the substrate (S) on the support surface (21a) further enhances the close contact property between the support surface (21a) and the substrate (S), so that thermal damage of the substrate (S) due to heat input during film formation can be prevented.