COATING APPARATUS

摘要

An Aerosol Assisted Chemical Vapor Deposition (AACVD) apparatus (A) for forming a coating (2) on a substrate (1). The apparatus comprises an atomizer (3) for turning the liquid precursor into droplets (5), an atomizer chamber (4) for mixing the aerosol and a deposition chamber (6) for depositing the coating (2) on the substrate (1). The deposition chamber (6) is placed downward from the atomizer chamber (4), and the atomizer chamber (4) is restricted in the direction of the aerosol flow by the wall (Wl) next to the deposition chamber (6) and an opposite wall (W2). The distance of the atomized spray (3S) from the wall (Wl) next to the deposition chamber (6) is shorter than the distance from the opposite wall (W2) in at least one part of the atomizer chamber (4).