发明名称 |
Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same |
摘要 |
There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.
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申请公布号 |
US2011318542(A1) |
申请公布日期 |
2011.12.29 |
申请号 |
US200913141945 |
申请日期 |
2009.12.15 |
申请人 |
MORI KAZUNORI;HAGIWARA YUJI;ISONO YOSHIMI;NARIZUKA SATORU;MAEDA KAZUHIKO;CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MORI KAZUNORI;HAGIWARA YUJI;ISONO YOSHIMI;NARIZUKA SATORU;MAEDA KAZUHIKO |
分类号 |
B32B3/00;C07C229/30;C08F220/22;G03F7/004;G03F7/20 |
主分类号 |
B32B3/00 |
代理机构 |
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代理人 |
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地址 |
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