发明名称 SUBSTRATE PROCESSING APPARATUS, PROCESSING TUBE, SUBSTRATE HOLDER, FIXING PART OF THE SUBSTRATE HOLDER, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD
摘要 There is provided a substrate processing apparatus, including: a substrate holder that holds a plurality of substrates (wafers) in a state of being arranged in a lateral direction (approximately in a horizontal direction) approximately in a vertical posture; a processing tube that houses the substrate holder; a throat side sealing part (throat side mechanical flange part) that air-tightly closes an opening part of the processing tube; a rotation part that rotates the substrate holder in a peripheral direction of the substrates, with an arrangement direction (a direction in which the substrates are held) of the plurality of substrates as a rotation axis, wherein the substrate holder includes a fixing part (movable holding part) and a fixture holding part for fixing the substrates approximately in a vertical posture.
申请公布号 US2011318489(A1) 申请公布日期 2011.12.29
申请号 US201013201510 申请日期 2010.02.08
申请人 ISHIZU HIDEO;SUZUKI MASAYUKI;HITACHI KOKUSAI ELECTRIC INC. 发明人 ISHIZU HIDEO;SUZUKI MASAYUKI
分类号 C23C16/458;B25B11/00;C23C16/455 主分类号 C23C16/458
代理机构 代理人
主权项
地址