PROCESS FOR PRODUCTION OF BARRIER FILM, AND PROCESS FOR PRODUCTION OF METAL WIRING FILM
摘要
<p>A metal nitride film, which serves as a barrier film, is formed on a substrate having a hole or trench formed therein by a CVD process or an ALD process, and the surface of the metal nitride film is irradiated with a hydrogen plasma or a hydrogen radical while applying a bias voltage to the substrate side of the metal nitride film.</p>
