MULTIPLE PATTERNING LITHOGRAPHY USING SPACER AND SELF-ALIGNED ASSIST PATTERNS.,申请号NL20112006655-传众专利搜索

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发明名称	MULTIPLE PATTERNING LITHOGRAPHY USING SPACER AND SELF-ALIGNED ASSIST PATTERNS.
摘要
申请公布号	NL2006655(A)	申请公布日期	2011.12.29
申请号	NL20112006655	申请日期	2011.04.22
申请人	ASML NETHERLANDS B.V.	发明人	LI, XIAOYANG;HSU, DUAN-FU
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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