发明名称 |
PATTERN FORMATION METHOD AND IMPRINT MATERIAL |
摘要 |
According to one embodiment, a pattern formation method is disclosed. The method can include forming a foundation film on a patterning film. The foundation film includes a reaction initiator to produce at least one of an acid and a base. The method can include forming an imprint film having an uneven configuration by coating an imprint material onto the foundation film and by causing a template to contact the imprint material. The method can include increasing an etching rate of a first portion of the imprint film higher than a second portion by introducing the at least one of acid and base into the first portion. The first portion is on the foundation film side. The second portion is a portion excluding the first portion. The method can include patterning the patterning film using a protruding portion of the uneven configuration as a mask.
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申请公布号 |
US2011315659(A1) |
申请公布日期 |
2011.12.29 |
申请号 |
US201113168417 |
申请日期 |
2011.06.24 |
申请人 |
SEKIGUCHI YUSUKE;KAWAMURA YOSHIHISA |
发明人 |
SEKIGUCHI YUSUKE;KAWAMURA YOSHIHISA |
分类号 |
B05D3/10;C07D233/60;C23F1/00 |
主分类号 |
B05D3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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