发明名称 Wiring Substrate, Semiconductor Device, and Method for Manufacturing Wiring Substrate
摘要 A wiring substrate includes a wiring pattern in an uppermost layer that includes pads. A solder resist layer covers the wiring pattern. A recess exposes part of the wiring pattern from the solder resist layer to form pads. The solder resist layer includes a portion formed in a region corresponding to the recess, a portion formed outward from the recess, and a portion formed inward from the recess. The upper surface of the solder resist layer at the portion corresponding to the recess is higher than the upper surface of the pads but lower than the upper surfaces of the other portions of the solder resist layer.
申请公布号 US2011316170(A1) 申请公布日期 2011.12.29
申请号 US201113166083 申请日期 2011.06.22
申请人 MURAMATSU SHIGETSUGU;SUNOHARA SATOSHI 发明人 MURAMATSU SHIGETSUGU;SUNOHARA SATOSHI
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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