发明名称 Semiconductor Device and Manufacturing Method Thereof
摘要 The aperture ratio of a pixel of a reflecting type display device is improved without increasing the number of masks and without using a black mask. Locations for light shielding between pixels are arranged such that a pixel electrode overlaps with a portion of a gate wiring and a source wiring. In locations for shielding TFTs, a high pixel aperture ratio is realized by forming a color filter (red, or lamination of red and blue), formed on an opposing substrate.
申请公布号 US2011317108(A1) 申请公布日期 2011.12.29
申请号 US201113225634 申请日期 2011.09.06
申请人 YAMAZAKI SHUNPEI;KOYAMA JUN;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;KOYAMA JUN
分类号 G02F1/1335;G02F1/1362;H01L21/336;H01L21/77;H01L27/12;H01L27/13;H01L29/786 主分类号 G02F1/1335
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