发明名称 INTEGRATED CIRCUIT SYSTEM WITH VIA AND METHOD OF MANUFACTURE THEREOF
摘要 A method of manufacture of an integrated circuit system includes: forming an etch stop layer over a bulk substrate; forming a buffer layer on the etch stop layer; forming a hard mask on the buffer layer; forming a through silicon via through the etch stop layer with the hard mask detected and the buffer layer removed with a low down force; and forming a passivation layer on the through silicon via and the etch stop layer.
申请公布号 US2011316166(A1) 申请公布日期 2011.12.29
申请号 US20100825266 申请日期 2010.06.28
申请人 YU HONG;LIU HUANG;ZHAO FENG;ZHOU MEISHENG;HSIA LIANG-CHOO;GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 YU HONG;LIU HUANG;ZHAO FENG;ZHOU MEISHENG;HSIA LIANG-CHOO
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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